Page 14 - Vol.17
P. 14

Tech
             Notes
             技術專文





                                             Figure 12. Nanopolis MEMS Development Center






















                                             Figure 13. Nananoplis MEMS Development Center Cross Section

            with the needs of the high-technology
            manufacturing equipment required
            for pilot operations.                                   Research & Development
            Nanopolis desired the Nano/MEMS                            Pilot Cleanroom
            to comprise multiple cleanroom floors
            with  a  separate  floor  containing
                                                                          Subfab
            research laboratories. Due to site
            constraints, two cleanrooms were          Support       Manufacturing Cleanroom  Central Utilities
            developed for 150mm and 200mm
            wafer MEMS pilot and development
                                                                          Subfab
            functions. A top floor was designed for
            laboratories with common modules
            for room suite configurations. Criteria
            for vibration had to encompass both
            VC-D and VC-C for key lithography
            a n d  a n a l y t i c a l f u n c t i o n s . To
            control structural costs, the first   Figure  14 demonstrates a sample
            level cleanroom (Manufacturing   view from the REVIT design model   The
            cleanroom) was designed for VC-D   h i g h l i g ht i n g  t he  m a i n  ut i l it y    Importance
            while  the  upper  level  cleanroom   system routings to the cleanroom
            provides VC-C vibration with a small   leve ls  a nd  lower  leve l  suppor t   of Sensitivity
            area with VC-D capability. See the   areas. Industrial engineers working
            illustrations of the facility concept.   with project architects and facility  to Project-
            Figure 12~13                     engineers coordinated the final design   Specific
             Due to the complexity of utility   based on research and pilot equipment
            systems and their d istr ibution   use p oi nt s, m ate r i a l h a nd l i ng   Design
            t h roug hout t he bu i ld i n g, I D C   and people flow to test all design
            Architects performed the design   elements of the multistory design.   Requirements
            on REVIT and created a full model   Specifically, industrial engineers
            to identify all research, pilot and   performed cleanroom equipment
            preliminary production equipment   layouts  (including  subfab  lower   There's an understandable temptation
            locations. Load analysis from the   levels), support area layouts, clean   to simply replicate a "Basis of Design"
            equipment assumptions sized the   gowning concepts, utility matrix   facility design approach for similar
            distribution system and extremely   reports, material storage concepts,   facilities as a cost-reduction strategy.
            rigid coordination planning ensured   material handling systems designs   However, there is ample evidence that
            minimal conflicts for services and   and material flow analysis including   this can be a risky assumption, based
            routings.  Figure 12~13          equipment move-in planning.     on the many variables that determine




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