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文│郭啟文│廠務技術發展專案│

Nanoparticle

Contaminants

Measuring and Source

Tracking System

奈米粒子捕捉技術介紹

A new nanoparticle detecting and tracking system has been proposed to measure nanoparticle
contamination and localize the source of the contaminant simultaneously in the cleanroom. The nanoparticle
tracking and localizing system consists of minimized nanoparticle sensors and an ad-hoc network is suitable
for most advanced semiconductor factories. Experimental results indicate that the system has higher counting
accuracy and controlled deviation in nanoparticle’s diameter measurement.

Introduction Particle Contamination
Control Network
he geometry of semiconductor fabrication
continues to shrink, particles’ diameter n the cold-war period, scientists worked
Tlarger than about ¼ of the line-width on the project of protecting people from
may cause fatal device defects. The challenge for Ithe threat of biochemical weapon’s attack.
ultra clean particle free facilities in the fabrication The research not only interested in targeting
of semiconductors has been well recognized the source of biochemical assault but also has to
since the line-width shrink dramatically. The establish the accurate boundary of danger. There
main target of particle contamination control were many successful application examples of
in semiconductor manufacturing fab is loss hazardous gas detecting system on the protection
prevention and yield enhancement, a nanoparticle from biochemical terrorism attack and accurate
detecting device and tracking system is urging boundary setting for preventing human exposure
and needed for this concern.
in the dangerous area. Such works had solid
results and we can facilitate the same technique

郭啟文 Chi-Wen Kuo
喜好騎車，閒暇時常DIY
維修整備，不假他人之手
休閒以戶外活動為主
經常偕家人一同游泳、爬山

NEW FAB TECHNOLOGY JOURNAL JUNE 2013 23