Page 7 - Vol.17

Integrating Next-

Generation Technology

Into Today’s Nano/MEMS

Research

Facilities

整合次世代技術

於現今奈米/微機電

廠務系統之探討

文│Monty Stranski│CH2M HILL 美商愛狄西股份有限公司│

Introduction

Nanotechnology and microelectromechanical systems (MEMS) research
facilities are sought largely by a blend of governmental, university and corporate/
private sector enterprises. With various missions, most are chartered to provide
the basis of technology exploration including research and development for
advanced electronic nano/micro manufacturing. These organizations are
challenged by providing research for many novel and at times very critical
processing environments, but within a cost-effective context. Cost constraints
related to such facilities include initial capital for facilities and equipment and
also efficient cost of ownership for activities and operations. Further, these
owner organizations desire an ever-increasing level of sustainable practice
and infrastructure focusing on energy and resource efficiency and safety best
practices. IDC Architects (the architectural arm of CH2M HILL Ltd.) provides
advanced design and construction services for Nano/MEMS research facilities
around the world. In response to the technical challenges of nano/MEMS
research, IDC Architects organizes projects to respond to:

Industrial and Advanced Technology Engineer/Fab Specialist; Portland, OR, USA. Mr. Stranski has over
30 years of experience in integrated circuit processes and tools, optoelectronics and photovoltaics
manufacturing, and nanotechnology, includes industrial engineering, cleanroom planning, utility analysis,
flow analysis, optimization planning, fab layout and hookup, and technical team leadership. Areas of
Monty
Stranski
technology for semiconductors include 450mm planning, EUVL preparation, 300mm fab and AMHS design.

NEW FAB ENGINEERING JOURNAL MARCH 2015 7