Page 64 - Vol.47

Tech
Notes
技術專文

Inspection, and Process Control for Microlithography, 6518.
[15] Jürgen M. Lobert, Philip W. Cate, David J. Ruede, Joseph R. Wildgoose,
Charles M. Miller, John C. Gaudreau, Advances in the understanding
of low molecular weight silicon formation and implications for
control by AMC filters, Metrology, Inspection, and Process Control for
Microlithography, 7638.
[16] SEMI F21-1102 classification of airborne molecular contaminant levels
in clean environments.
[17] ISO-14644-8 Cleanrooms and associate controlled environments–
Part 8: Classification of airborne cleanliness by chemical concentration.
[18] INTERNAIONAL TECHNOLOGY ROADMAP FOR SEMICONDUCTOR
2.0 – 2015 EDITION – YIELD ENHANCEMENT.

作者介紹

莊鎧瑋 Kai Wei Zhuang
生
活 愛籃球的奔騰、威士忌的熟成、書本的沉穩。
照 Listen to the voice. Go for what you love.

圖16、AMC循環改善邏輯判斷流程

參考文獻
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[02] Yong Yu, Xiaosheng Si, Changhua Hu, Jianxun Zhang, A Review of
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[03] Elle Knows Machines, LINEAR REGRESSION: THE BEGINNER’S
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[04] Dastan Hussen Maulud, Adnan Mohsin Abdulazeez, A Review on
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[05] Mariana Belgiu, Lucian Dra˘gut, Random forest in remote sensing:
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[06] ALEX J. SMOLA, BERNHARD SCHO¨ LKOPF, A tutorial on support
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[07] Mehar Vijh, Deeksha Chandola, Vinay Anand Tikkiwal, Arun Kumar,
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[08] María Vega García, José L. Aznarte, Shapley additive explanations for
NO2 forecasting, Ecological Informatics, 56 (2020), 101039 .
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[10] VICTORIA J. HODGE, JIM AUSTIN, A Survey of Outlier Detection
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[11] Jigar Patel, Sahil Shah, Priyank Thakkar, K. Kotecha, Predicting stock
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[12] Peng Sun, Caroline Ayre, and Matthew Wallace, Characterization
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[13] Decheng Kong, Chaofang Dong, Aoni Xu, Cheng Man, Chang He &
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[14] Oleg Kishkovich, Anatoly Grayfer, Frank V. Belanger, Contrarian
approach to and ultimate solution for 193nm reticle haze, Metrology,

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