Page 60 - Vol.45

Tech
Notes
技術專文

TSMC / FACILITY PUBLISHED
VOL.45
廠務季刊

URL.http://nfjournal/

氟氣排放診斷

Diagnosis systemic for Fluorine emission

文│林朝順│台南廠務二部│

摘要 / Abstract

半導體製程原物料與副產物中含有多種危害性氣體(腐蝕/爆炸/毒性/...等)，因此需在主機台後端裝設前段廢氣處理設備(LSC)
來處理這些危害性氣體，才可確保廢氣排放達到安全及環保的規格。然而這些高腐蝕性氣體也會侵蝕LSC內部不銹鋼管件，導致
廢氣未依正常路徑處理而短流到煙囪；但這項異常卻無法透LSC本身儀表來偵測，往往需等到保養或煙囪採樣時才能發現。
為解決此問題我們找出這些常因腐蝕導致廢氣短流至煙囪的LSC集中於CVD製程區，因此我們於該區Exhaust submain架設
F 2 尾氣濃度連續監測分析系統做即時性監測，但因無法精準找到異常LSC還是需耗費人力與時間逐一拉機檢查；為此我們研究結
合F 2 尾氣濃度分析系統與主機台的FDC兩套系統，透過系統的精準比對找出異常的LSC機台便可快速反應減少空汙超標風險。

關鍵詞 / 前段廢氣處理設備、F 2 尾氣濃度分析系統、FDC

The raw materials and by-products of the semiconductor process contain a variety of hazardous gases(corrosion/explosion/
toxicity...) Therefore, it is necessary to install Local Scrubber(LSC) to treat these hazardous gases to ensure that the exhaust gas
emission meets the safety and environmental protection specifications. these highly corrosive gases will also corrode the stainless-
steel pipe fittings inside the LSC, causing the exhaust gas to flow to the chimney without following the normal path. However, this
anomaly cannot be early detected by the LSC itself. Often need to wait for maintenance or chimney sampling to find out.
In order to solve this problem, we found that these LSCs with short exhaust gas flow caused by corrosion are concentrated in
the CVD process area. Therefore, we set up F 2 exhaust gas concentration continuous monitoring and analysis system in the Exhaust
submain for real-time monitoring. However, because it is impossible to accurately find abnormal LSCs or It takes manpower and
time to check each LSC one by one. therefore, we studied the F 2 exhaust gas concentration analysis system and the FDC system.
Through the accurate comparison of the two system, we can be to find out the abnormal LSCs quickly and reduce the risk of air
pollution exceeding the standard.

Keywords / Local Scrubber(LSC)、Exhaust Gas(Fluorine, F 2 ) Concentration Analysis System、Fault Detection and Classification(FDC)

1. 前言

2020 F14A P12 FAB GMS多次有F 2 微量讀值干擾(圖1)， 溫並未設計水洗與裝設化學濾網，才導致這些異常的F 2 尾氣
至現場使用TLD1量測皆查無漏源；而此干擾頻率一個月最高 供應到環境產生干擾。
將近22次造成值班人員負擔過重，後續比對相關資料發現干 為追查F 2 排放異常來源我們透過儀器量測該區域6隻煙
擾來源為頂樓SEX煙囪F 2 排放異常所致，因為廠區煙囪配置剛 囪，發現此異常是具有週期性、排放濃度偏高情形最大高於
好旁邊就為HPM MAU入口(圖2)，在大氣環境平均風速小於 偵測上限且集中於CVD製程區(表1)；由這項資訊讓我們快速掌
2m/s且擴散條件不佳下，這些煙囪排放異常的F 2 氣體就會沉 握溯源的方向，查找到多台安裝於CVD製程區的KT-F5 LSC內
降到MAU入口透過風車吸入，因該區域MAU功能是環境控 部的管件腐蝕破洞(圖3)，使得主機台使用NF 3 清潔反應腔解離

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