Page 65 - Vol.45

TSMC / FACILITY PUBLISHED
VOL.45
廠務季刊

URL.http://nfjournal/

IOT技術應用於FFU轉速自動化調整無塵室溫度均勻分布

IOT Technology Is Applied To The FFU Speed Control Automatically For The Evenly
Temperature Of The Clean Room

文│蕭睿呈│台南廠務六部│

摘要 / Abstract

近年來物聯網技術發展越趨成熟，與半導體產業相輔相成，電晶體到了21世紀，製程已達到奈米等級，大幅降低功耗，而
低功耗設計正是物聯網中的感測器可否被廣泛運用的關鍵因素，因此半導體技術的進步是促成物聯網快速發展的推手，也是促
成物聯網普及的原因。此外，半導體製程的蓬勃發展有賴於無塵室內的溫溼度、氣態分子汙染物等生產環境品質的嚴格控管，
影響著製程區域產品良率。目前對於無塵室溫度控制仍以實體訊號線傳輸搭配冰水閥的自動調整來達到製程區內溫度穩定控制
需求。但偌大無塵室製程區內僅靠單點溫度回授控制容易有熱點集中及溫度分布不均的現象，本篇擬在透過IOT技術搭配巡檢機
器人回傳溫溼度時，並同時連動相對應區域FFU轉速調整，來達到製程區內的溫度均勻控制。

關鍵詞 / 物聯網技術、風扇過濾組、自動巡檢機器人、濃度分布圖、工業4.0

In recent years, the development of the Internet of Things(The following is referred to as IOT.) technology has become more
mature and complementary to the semiconductor industry. By the 21st century, the process of chip has reached the nanometer
level, which greatly reduces power consumption. And low-power design is key factor whether sensors with IOT technical can
be widely used. Therefore, the advancement of semiconductor technology is the driving force for the rapid development , and
it is also the reason for the popularization. In addition, the vigorous development of the semiconductor process depends on
strict control of the production environment quality such as temperature and humidity in the clean room, gaseous molecular
pollutants, etc., which affects the product yield in the process area. At present, the temperature control in the clean room still
be transmitted by solid signal wires with the automatic adjustment of the chiller water control valve to achieve the temperature
stability control requirement in the process area. However, every partition of clean room, the temperature value is real-time, that
is only single point to feedback value for control, and it is prone to hot spot concentration and uneven temperature distribution.
This article intends to use IOT technology with inspection AGV to feedback temperature and humidity, and trig FFU speed
automatic adjustment to reach temperature uniform control the at the same time.

Keywords / IOT、FFU、AGV、Contour、Industry 4.0

1. 前言

無塵室(以下簡稱CR)內穩定溫濕度的控管，對於近年來發 後，由機台內壓縮機將空氣進行二次穩定控溫，若進氣溫度
展迅速的半導體製程有著密切關係，為晶圓廠獲利中不可或缺 高，將影響機台內壓縮機的耗功或壽命，若運轉過程中壓縮機
的一環。如黃光機台製程對環境溫度穩定的嚴謹要求，若在機 故障，亦造成機台產品的影響。故無塵室溫度控制如 圖1所示，
台運轉過程中溫度發生偏差，那機台內的Lens，定位sensor的精 外氣(以下簡稱OA)經由penthouses進入空調箱(Make up Unit ，
準度都因熱漲冷縮而發生偏移，將造成Wafer Low yield 或報廢。 以下簡稱MAU)內處理氣態分子汙染物以及穩定的控溫控濕後，
又或者是黃光內對於進氣溫度的穩定控制，環境空氣進入機台 將新鮮空氣提供至回風道與CR內循還空氣進行混合。CR製程區

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