Page 52 - Vol.47
P. 52

Tech
                                                                                                    Notes
                                                                                                    技術專文


                                                  TSMC / FACILITY PUBLISHED
           VOL.47
                                                   廠務季刊


                                                     URL.http://nfjournal/



           RD Fab外氣AMC改善-沸石濃縮轉輪運轉參數最佳化之分析與驗證

           RD Fab Outside Air AMC Improvement-Analyzation and Verification of Optimizing
           Operating Parameters of Zeolite Rotor Concentrator


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                                                                      文│陳建豪  詹資盛  張貴琳 │ 新竹廠務四部  新竹廠務六部│
           摘要 / Abstract
              隨著半導體製程的演進，氣態分子汙染物(Airborne Molecular Contamination, AMC)對於半導體製程良率的影響愈來愈顯
           著，並有許多案例證實其中的低分子量汙染物IPA對於B.S.(Barrier Seed)及ECP(Electrochemical Plating)製程之晶邊良率有著極大
           影響。經調查發現B.S./ECP區域IPA主要來源為本身或鄰近廠區煙囪排放再經由外氣空調箱(Make-up Air Unit, MAU)引入(約占
           70%)，其次為B.S./ECP相鄰區域機台保養使用之IPA經由潔淨室流場引入(約占30%)。本文主要探討藉由透過調整調整沸石濃縮
           單轉輪系統運轉操作參數，使其運轉最佳化提升去除效率降低IPA煙囪排放汙染源，進一步降低潔淨室IPA OOC次數確保穩定運
           轉，供相關改善方式為後續進行參考。

           關鍵詞 / 沸石轉輪、揮發性有機物、參數最佳化、IPA、AMC

              With the evolution of semiconductor process, the influence of airborne molecular contamination(AMC) on the yield of
           semiconductor process has become more and more significant. It has been found that IPA has a great influence on the yield of
           B.S.(Barrier Seed) and ECP(Electrochemical Plating) processes from many confirmed cases. After investigation, the main source of
           IPA in the B.S./ECP is the chimney emission from itself or adjacent fab and then introduced through the Make-up Air Unit(MAU)
           (about 70%). The secondary source is the IPA used for tool maintenance in the nearby processes area which is introduced
           through the flow field in clean room(about 30%). This work introduces the way how to improve the Volatile Organic Compounds
           (VOCs) removal efficiency by optimizing the operating parameters of the zeolite rotor concentrator system, therefore the IPA
           chimney emission would be reduced. The result shows that it ensures stable operation of clean room and reduces the counts of
           OOC per year. It is expected that the result of this work can be the reference for future studies.

           Keywords / Zeolite Rotor Concentrator, Volatile Organic Compounds(VOCs), Optimizing Operating Parameters, IPA, AMC



           1.  前言

              隨製程不斷演進，潔淨室環境控制要求也隨之更加嚴                        散及製程排氣或製程氣體管路洩漏等，以及因自動化搬運系
           格，控制條件包含溫溼度、微粒子、靜電、震動及氣態分子汙                       統(AMHS)將晶原傳送盒(Foup)傳送至各製程需破壞原有隔間
           染物(Airborne Molecular Contamination, AMC)等等；綜觀潔   牆，進而使VOCs汙染物由搬運車運送過程夾帶之氣流造成交
           淨室空調循環系統(如 圖1所示)可以得知AMC中揮發性有機物                    叉汙染。
           (Volatile Organic Compounds, 以下簡稱VOCs)主要來源分為          VOCs其中的異丙醇(Isopropyl Alcohol, IPA)普遍用於機台
           兩類，主要汙染來源來自於外氣引入即為本身或鄰近廠區煙囪                       清潔與晶圓清洗製程為常見之有機溶劑，並已有許多案例證
           排放、廢水處理過程之氣體逸散、廠區頂樓進行有機溶劑作業                       實IPA對於B.S.及ECP製程之晶邊良率有著極大影響。經過調查
           施工等，其次為潔淨室內部作業產生，為機台及廠務系統維修                       得知B.S./ECP兩區IPA主要來源為本身或鄰近廠區煙囪排放再
           保養使用有機溶劑作業、化學機械研磨製程或溼式酸槽系統逸                       經由外氣空調箱(Make-up Air Unit, MAU)引入(約占70%)，其

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