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laser sensor to an image camera. The
                second is the wafer thinning process    450mm Si single crystal
                may need a backup solution in case                                New sustaining
                                                                                   mechanism
                there  is  something  wrong during
                wafer backside grinding process.
                                                          Seed                        Total
                After recovery procedure, the grinding    crystal                     940kg
                blue tape will block the identity of                                              800kg
                                                                                     Diameter  Dislocation-free single crystal
                die grid for the following die saw tape   Dash neck                  450+α mm     215cm
                                                          Mechanical
                adhesion process.                         strength            Crystal growth
                Bigger wafer size needs wider process
                chamber in diameter, which means                                3-5 days
                more space and room to arrange                      Molten Si              Residual Si
                                                                     (1000kg)
                more desired control zone and sensor                             Quartz
                location. With this advantage, the                               crucible
                process control can be much more        450mm Si polished wafer
                precise and adjustable. This is a real
                trend in current 450mm chamber           Wafer thickness            Near edge
                                                                                     surface
                design since this industry already has               Wafer breakage   atness
                adequate knowledge and experience
                upon how to improve the process
                chamber design. This is also true that                                                Edge defect
                300mm chamber is physically limited
                by the chamber and device size,                                                Edge shape
                                                                       450mm
                450mm gives the chance to release
                this restrain.
                                                                      Gravity sag

                                                        Source.  Masaharu Watanabe and Scott Kramer The Electrochemical Society Interface • Winter 2006
                An Expected Growth
                in Market and Demand                    Fig.2  450 mm Silicon : An Opportunity and Wafer Scaling.



                      here is a big question mark        25,000        Total
                      about the equipment market         Silicon demand (MSI)  20,000  450mm
                Tsize. The answer might come                           300mm
                                                                       200mm
                from the silicon wafer growth and        15,000        150mm
                replacement from 200mm to 300mm.
                Some data from Iceknowledge LLC [3]      10,000
                show that since 2010, the quantity of
                                                          5,000
                300mm Si wafer has almost doubled
                than the 200mm wafer. Fig.3 This
                                                             0
                data indicate the equipment market           1975    1980     1985    1990     1995    2000     2005    2010     2015    2020     2025    2030
                                                                                                     Year
                size must be much bigger than             Source.  300mm and 450mm Forecast Model – silicon
                                                           edition -1202, IC Knowledge LLC (2012)
                200mm’s since for sure the process
                complexity of 300mm overwhelms          Fig.3  Worldwide Silicon Demand by Wafer Size
                200mm. Meanwhile, the top three IC
                makers are casting capital in building   from 1999 to 2012 Fig.5, both revenue and net margin show a quite
                300mm capacity in recent decade,     healthy condition. Therefore, 450mm equipment market size
                which offers the fuel to drive 450mm   should increase certain percentage in the coming future, and
                tool development without financial   the difference is the buyer number will drop to single digit since
                drawback. Fig.4  According  to  the   both technology and capital barriers will naturally become a
                financial report of top 8 tool suppliers   kind of monopoly situation and tool supplier side vice versa.




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