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廠務季刊 Facility Journal 2023

光譜分析儀應用於低壓氣體品質監測之技術開發
Development of a quality monitoring technique of low-pressure gases by
applying the Optical Emission Spectroscopy(OES)
文│王紹宇 蔣竣光 劉俊男│台中廠務四部

摘要

摘要 F15B 廠務過去三年曾歷經了多次 SiCl 4 氣體鋼瓶供應品質異
常的狀況。每次事件都是發生在氣櫃切邊供應之後約莫 20-60
1. 前言
分鐘，線上機台反映測得 N 2 不純物，今年在 F18A 與 F15A 也
2. 文獻探討 遇到類似情形。為解決此問題，本研究開發了一套採用自形
成 電 漿 光 譜 (Self Plasma Optical Emission Spectroscopy,
2.1 SiCl 4 鋼瓶品質異常案例分享
SPOES) 量測技術的分析儀，用以偵測 SiCl 4 低壓氣體鋼瓶
2.2 SPOES分析儀的應用 內之 N 2 不純物。實驗參數比照線上機台設定，針對波長為
337nm 光強度進行量測，並控制在 2torr 的低壓量測環境。
3. 實驗方法
實驗結果顯示，透過連續分析 337nm 光譜強度的變化，
4. 結果與討論 SPOES 可有效的辨別出內含 N 2 不純物的品質異常鋼瓶。
4.1 OES量測分析參數測試與選定 關鍵詞 : 四氯化矽、光譜分析儀、N 2 不純物
4.2 SPOES對品質異常/正常
F15B facility has experienced several SiCl 4 gas cylinder
SiCl 4 鋼瓶的辨別力測試
quality abnormal events in the past three years. All
the events occurred after the abnormal cylinder was
5. 結論
switched to supply for about 20 to 60 minutes, then
參考文獻 the N 2 impurity was detected by the etching tool.
Similar cases also occurred at F18A and F15A in this
作者介紹 year. To solve this problem, this study developed an
analyzer by using the self-plasma optical emission
spectroscopy(SPOES)technique, to detect the N 2 impurity
in the SiCl 4 gas cylinder. The measurement parameters
were set as the same with etching tool, in which the
detected wavelength is focused on 337nm and the
pressure was controlled at 2torr. Results showed that by
continuous analyzing the intensity of 337nm wavelength,
the SPOES is able to distinguish the abnormal SiCl 4 gas
cylinder containing with N 2 impurity.
Keywords : Silicon Chloride, Self Plasma-Optical
Emission Spectroscopy(SPOES), N 2 Impurity

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