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Notes
技術專文
參考文獻
[1] Muller, A. J., Psota-Kelty, L. A., Krautter, H. W., and Sinclair, J.
D., "Volatile Cleanroom Contaminants : Sources and
Detection," Solid State Technol., 37(9) : 61-72, 1994.
[2] Kinhead, D.A, "Forecast of Airborne Molecular Contamination
Limits for 0.25 Micron High Performance Logic Process,"
Technology Transfer Report 95052812A-TR, SEMATECH, May
31, 1995.
[3] Ogawa Hiroki、Horiike Yasuhiro著，嚴誠廷譯「半導體潔淨技
術」普林斯頓國際有限公司，2003。
[4] D.Ruede, M.Ercken, T. Borgers. The impact of airborne
molecular bases on DUV photoresists.Solid State Technolo
gy, 2001.
[5] 林育旨以GC/MS偵測高科技工業區內空氣中揮發性有機物濃度
之研究，2010。
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