Page 45 - Vol.43
P. 45

TSMC / FACILITY PUBLISHED
                VOL.43
                                                         廠務季刊


                                                          URL.http://nfjournal/



                探討廠務實驗室發展藍圖

                Discussion on The Development Roadmap of Facility Laboratory




                                                                                               文│吳連芳│廠務技術發展部│


                摘要 / Abstract

                    在半導體工廠裡廠務扮演極重要的角色，來自供應商的原物料(水、化學品、研磨液、氣體、空氣)，都需經由廠務系統供
                應至生產線，使用後的廢水、廢酸、廢氣，又須經由廠務系統處理。面對日益精密的製程，廠務系統的品質也必須不斷提升，
                而品質的提升必須仰賴正確的分析數據，為加速改善的速度，建構一個廠務專有，同時具備有機、無機、微物及材料熱機械
                分析能力的實驗室是必須的，藉此實驗室的分析找出系統、手法、材料中(管材、閥件、幫浦等)影響品質的關鍵指標，訂定標
                準，並針對重要項目建立線上、可攜式的現場分析設備，有效監測系統品質，預防問題發生，同時兼顧產品品質及綠色環保。

                關鍵詞 / 廠務實驗室、發展藍圖、廠務分析技術與方法、化學分析、材料分析

                    Facility plays a very important role in the semiconductor manufacturing by supplying all the raw materials provided
                by the suppliers to the production line, such as water, chemical, slurry, air and gas. They also treat all the waste water,
                acid and gas produced from the manufacturing. Facility keeps improving the system quality to reach the high-quality
                requirement of the raw materials for the advanced IC manufacturing. However, the quality improvement relies on the
                correct and precise analysis. In order to accelerate the quality improvement of the facility systems, it is necessary to
                construct an exclusive lab with organic, inorganic, micro and thermal mechanical analysis capability. Through the lab
                analysis, the key indexes to affect the quality in the system, methodology, and material(tube, valve, and pump...etc.)
                would be pointed out, and the specification and the operating procedure would be defined and optimized. Moreover,
                facility will focus on the important factors to construct the in-line systems or portable instruments for effectively
                monitoring the facility system quality, preventing the impact to the production line, and keeping the product quality and
                the environmentally friendly manufacturing.

                Keywords / Facility Laboratory, Development roadmap, Facility analysis technology and methodology, Chemical analysis,
                Material analysis



                1.  前言

                    隨著半導體技術的不斷演進，先進精密製程對於材料                        外的污染物外，還扮演進一步純化的角色，在使用點(Point
                及生產環境品質的要求越來越嚴苛，所有與製程相關之原                          on Use, POU)接觸產品前，將原物料在製造與運送過程導入
                物料包括水、化學品、研磨液、氣體、甚至無塵室生產線                          的不純物及微粒子(particle)再進一步移除，因此，廠務供應
                的空氣，依據「國際裝置和系統發展藍圖」(International                  系統的品質與維護攸關產品的品質與良率。
                Roadmap for Devices and System, IRDS) [01]  預測，材料品質    在製程開發與量產的過程中，如何兼顧環境保護，符
                將隨製程技術演進被推展至極致。而這些原物料的使用都需                         合「綠色製造」，這是企業社會責任，環境永續的課題，而
                經由廠務供應系統傳送至生產線，供應系統不僅不可導入額                         製程後所有產生的廢氣、廢酸、廢水，又經由廠務系統作後


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