A Study of Slurry Supply Quality during Stage Transfer from Advanced Process to Mass Production : A Case of WMG Slurry
先進製程轉量產之研磨液供應品質探討─以鎢金屬閘極製程研磨液為例
半導體製程中,積體電路的線路由微影顯像及光阻蝕刻的方式製造,線路的厚度則是藉由化學機械研磨(Chemical- Mechanical Planarization, CMP)的平坦化製程所控制。隨著製程線寬的微縮,CMP製...
按讚
0收藏
0點閱 (167)